AlGaN/InGaN/GaN Double Heterostructure Field-Effect Transistor      
Yazarlar (10)
Simin Grigory
Hu Xuhong
Prof. Dr. Salih SAYGI Tokat Gaziosmanpaşa Üniversitesi, Türkiye
Tarakji Ahmet
Zhang Jianping
Koudymov Alexei
Yang Jinwei
Khan M Asif
Shur Michael S
Gaska Remigijus
Makale Türü Özgün Makale
Makale Alt Türü SSCI, AHCI, SCI, SCI-Exp dergilerinde yayınlanan tam makale
Dergi Adı JAPANESE JOURNAL OF APPLIED PHYSICS
Dergi ISSN 0021-4922 Wos Dergi Scopus Dergi
Dergi Tarandığı Indeksler SCI
Dergi Grubu Q4
Makale Dili İngilizce
Basım Tarihi 01-2001
Cilt No 40
Sayı 11
Sayfalar 1142 / 1144
DOI Numarası 10.1143/JJAP.40.L1142
Özet
Novel, current collapse free, double heterostructure AlGaN/InGaN/GaN field effect transistors (DHFETs) are fabricated on the insulating SiC substrates. The simulations show that a combined effect of the bandgap offsets and polarization charges provides an excellent 2D carrier confinement. These devices demonstrate output RF powers as high as 4.3 W/mm in CW mode and 6.3 W/mm in the pulsed mode, with the gain compression as low as 4 dB.
Anahtar Kelimeler
GaN | HEMT | Heterostructure | HFET | InGaN | LP-MOCVD
BM Sürdürülebilir Kalkınma Amaçları
Atıf Sayıları
WoS 108
SCOPUS 127
Google Scholar 175
AlGaN/InGaN/GaN Double Heterostructure Field-Effect Transistor

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